Product Information/ PRODUCTS /Pan-Scan-Closed Loop-Cryogen-Free Scanning Tunneling Microscope System
Pan-Scan-Closed Loop-Cryogen-Free Scanning Tunneling Microscope SystemPan-Scan-Closed Loop-Cryogen-Free Scanning Tunneling Microscope System
specification：
The world's only Pan-Scan-Closed Loop-Cryogen-Free Scanning Tunneling Microscope System
RHK has developed a cryogen-free low-temperature STM/qPlusAFM system that eliminates the need for liquid helium. With unique vibration damping and noise isolation technologies, the system directly connects the pan-style STM/qPlusAFM probe to the cooling machine, overcoming the limitations of traditional low-temperature STM/AFM systems dependent on liquid helium. The system incorporates the latest R9 scanning probe microscope controller to achieve stable atomic-level resolution imaging in low-temperature environments.
Key technical parameters are as follows:
- Operating temperature range: 15K-300K
- Scan range: 5×5 micrometers
- Sample size: 10×10 millimeters
- XYZ coarse displacement range: 5×5×10 millimeters
- Both sample and probe are at low temperatures
- Effective elimination of mechanical and electronic noise
DESCRIPTION
The world's only Pan-Scan-Closed Loop-Cryogen-Free Scanning Tunneling Microscope System
RHK has developed a cryogen-free low-temperature STM/qPlusAFM system that eliminates the need for liquid helium. With unique vibration damping and noise isolation technologies, the system directly connects the pan-style STM/qPlusAFM probe to the cooling machine, overcoming the limitations of traditional low-temperature STM/AFM systems dependent on liquid helium. The system incorporates the latest R9 scanning probe microscope controller to achieve stable atomic-level resolution imaging in low-temperature environments.
Key technical parameters are as follows:
- Operating temperature range: 15K-300K
- Scan range: 5×5 micrometers
- Sample size: 10×10 millimeters
- XYZ coarse displacement range: 5×5×10 millimeters
- Both sample and probe are at low temperatures
- Effective elimination of mechanical and electronic noise
