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Atomic Deposition System Anric
Meiwafosis Pre-processing System for Point Microscope
Plasma-enhanced chemical vapor deposition system for TEOS multi-wafer processing
Inductively Coupled Plasma Etching System with Multiple Chambers
Plasma-Enhanced Chemical Vapor Deposition System (PECVD)
Plasma-Enhanced Chemical Vapor Deposition System PP1000 PECVD
Physical Vapor Deposition System PVD
Atomic Layer Deposition System FlexAL ALD
Electron Microscope High-Resolution Osmium Coating Machine
Measuring / Analyzing Instruments
OEG Optical Measurement
SURAGUS Non-Contact - Sheet Resistance and Film Thickness Measurement Instrument
SITA cleainess/ tension meter/ foam analysis
VINE Film Thickness Measurement
XPS/ESCA X-ray Photoelectron Spectroscopy/X-ray Photoelectron Spectroscopy for Chemical Analysis
Precision X-ray Cabinet Irradiator for Cells/Animals
Unisoku
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SPM Surface Morphology Analysis
STM Surface Morphology Analysis
SEM Surface Morphology Analysis
Nano-indenter Material Stress-Strain Analysis
Factory gas detector
Chemcassette Toxic Gas Detection
Electrochemical Gas Detector
FT-IR Centralized Gas Monitoring System
Explosion-proof Gas Detector
Portable Gas Detector
Liquid leak film detection
Manufacturing / production equipment
OIPT
CVI
TANKA Nanomaterials and Spherical Material Preparation Equipment
SURAGUS Non-Contact - Sheet Resistance and Film Thickness Measurement Instrument
Wafer Cleaving Machine SELA
semiconductor
Particle Deposition System
Particle Deposition Services
SELA
X-ray Photoelectron Spectroscopy/X-ray Photoelectron Spectroscopy for Chemical Analysis
HoneyWell
Academic field
Cryogenic System Bluefors
Cryogenic System CIA
Scanning Tunneling Microscope RHK
Scanning Tunneling Microscope Unisoku
High-Temperature Equipment CVI
X-ray Photoelectron Spectroscopy/X-ray Photoelectron Spectroscopy for Chemical Analysis
Quantum research
Toxic Gas Monitoring System Integration
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Product Information
/ PRODUCTS /
haracteristic materials / consumables
Nano Silica Suspension
AFM tips
GRAPHENE
Tekna Spheroidized Powder/ Nano Powder
Process equipment
Atomic Deposition System Anric
Meiwafosis Pre-processing System for Point Microscope
Plasma-enhanced chemical vapor deposition system for TEOS multi-wafer processing
Inductively Coupled Plasma Etching System with Multiple Chambers
Plasma-Enhanced Chemical Vapor Deposition System (PECVD)
Plasma-Enhanced Chemical Vapor Deposition System PP1000 PECVD
Physical Vapor Deposition System PVD
Atomic Layer Deposition System FlexAL ALD
Electron Microscope High-Resolution Osmium Coating Machine
Measuring / Analyzing Instruments
OEG Optical Measurement
SURAGUS Non-Contact - Sheet Resistance and Film Thickness Measurement Instrument
SITA cleainess/ tension meter/ foam analysis
VINE Film Thickness Measurement
XPS/ESCA X-ray Photoelectron Spectroscopy/X-ray Photoelectron Spectroscopy for Chemical Analysis
Precision X-ray Cabinet Irradiator for Cells/Animals
Unisoku
IMAGE
SPM Surface Morphology Analysis
STM Surface Morphology Analysis
SEM Surface Morphology Analysis
Nano-indenter Material Stress-Strain Analysis
Factory gas detector
Chemcassette Toxic Gas Detection
Electrochemical Gas Detector
FT-IR Centralized Gas Monitoring System
Explosion-proof Gas Detector
Portable Gas Detector
Liquid leak film detection
Manufacturing / production equipment
OIPT
CVI
TANKA Nanomaterials and Spherical Material Preparation Equipment
SURAGUS Non-Contact - Sheet Resistance and Film Thickness Measurement Instrument
Wafer Cleaving Machine SELA
semiconductor
Particle Deposition System
Particle Deposition Services
SELA
X-ray Photoelectron Spectroscopy/X-ray Photoelectron Spectroscopy for Chemical Analysis
HoneyWell
Academic field
Cryogenic System Bluefors
Cryogenic System CIA
Scanning Tunneling Microscope RHK
Scanning Tunneling Microscope Unisoku
High-Temperature Equipment CVI
X-ray Photoelectron Spectroscopy/X-ray Photoelectron Spectroscopy for Chemical Analysis
Quantum research
Toxic Gas Monitoring System Integration
Non-Contact - Sheet Resistance and Film Thickness Meter EddyCus® TF Inline Series
Non-Contact - Sheet Resistance and Film Thickness Meter EddyCus® TF Mapping Series
Non-contact-sheet resistance and film thickness measuring instrument EddyCus® TF lab 2020SR series
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