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Nano Silica Suspension AFM tips GRAPHENE Tekna Spheroidized Powder/ Nano Powder

Atomic Deposition System Anric Meiwafosis Pre-processing System for Point Microscope Plasma-enhanced chemical vapor deposition system for TEOS multi-wafer processing Inductively Coupled Plasma Etching System with Multiple Chambers Plasma-Enhanced Chemical Vapor Deposition System (PECVD) Plasma-Enhanced Chemical Vapor Deposition System PP1000 PECVD Physical Vapor Deposition System PVD Atomic Layer Deposition System FlexAL ALD Electron Microscope High-Resolution Osmium Coating Machine

OEG Optical Measurement SURAGUS Non-Contact - Sheet Resistance and Film Thickness Measurement Instrument SITA cleainess/ tension meter/ foam analysis VINE Film Thickness Measurement XPS/ESCA X-ray Photoelectron Spectroscopy/X-ray Photoelectron Spectroscopy for Chemical Analysis Precision X-ray Cabinet Irradiator for Cells/Animals Unisoku IMAGE SPM Surface Morphology Analysis STM Surface Morphology Analysis SEM Surface Morphology Analysis Nano-indenter Material Stress-Strain Analysis

Chemcassette Toxic Gas Detection Electrochemical Gas Detector FT-IR Centralized Gas Monitoring System Explosion-proof Gas Detector Portable Gas Detector Liquid leak film detection

OIPT CVI TANKA Nanomaterials and Spherical Material Preparation Equipment SURAGUS Non-Contact - Sheet Resistance and Film Thickness Measurement Instrument Wafer Cleaving Machine SELA

Particle Deposition System Particle Deposition Services SELA X-ray Photoelectron Spectroscopy/X-ray Photoelectron Spectroscopy for Chemical Analysis HoneyWell

Cryogenic System Bluefors Cryogenic System CIA Scanning Tunneling Microscope RHK Scanning Tunneling Microscope Unisoku High-Temperature Equipment CVI X-ray Photoelectron Spectroscopy/X-ray Photoelectron Spectroscopy for Chemical Analysis Quantum research